I have been working on techniques that will allow for the growth of single-and multi-walled carbon nanotubes with a variety of densities. The various catalytic formulas are deposited onto the surface of interest through ion beam sputtering. This technique can also be used with standard shadow masking methods to produce growths of NTs within a patterned area.

Other procedures are also being investigated to remove the amorphous carbon and metal contamination from the carbon nanotubes. These procedures are done following the growth of the NTs with further investigation into the ability to remove the contamination during the growth process itself.

These techniques will be combined with Plasma Enhanced Chemical Vapor Deposition to create an even more flexible platform upon which to grow carbon nanotubes.